The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8041105 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 18, 2011

Filed:

Aug. 29, 2007
Applicant:

Tadashi Mitsui, Kamakura, JP;

Inventor:

Tadashi Mitsui, Kamakura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); H03C 3/00 (2006.01); H03D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern evaluation method includes: acquiring a plurality of examination images obtained in regard to an evaluation target pattern, at least one of the plurality of examination images being different from the other examination images; detecting all edges of the evaluation target pattern in each of the examination images; executing alignment of the evaluation target pattern in the respective examination images with a sub-pixel accuracy based on the detected edges; superimposing the aligned pattern edges to generate a single combined edge; measuring the combined edge; and evaluating the evaluation target pattern based on a result of the measurement.


Find Patent Forward Citations

Mitsui, Tadashi. (2011). Pattern evaluation method, computer-readable medium, and semiconductor device manufacturing method (U.S. Patent No. 8041105). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8041105

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