The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8040491 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 18, 2011

Filed:

Jan. 10, 2008
Applicants:

Soichi Owa, Kumagaya, JP;

Nobutaka Magome, Kumagaya, JP;

Shigeru Hirukawa, Tokyo, JP;

Yoshihiko Kudo, Tokyo, JP;

Inventors:

Soichi Owa, Kumagaya, JP;

Nobutaka Magome, Kumagaya, JP;

Shigeru Hirukawa, Tokyo, JP;

Yoshihiko Kudo, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.


Find Patent Forward Citations

Owa, Soichi. (2011). Exposure method, substrate stage, exposure apparatus, and device manufacturing method (U.S. Patent No. 8040491). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8040491

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