The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Feb. 05, 2009
David J. Coumou, Webster, NY (US);
Paul Eyerman, Penfield, NY (US);
Carl Ioriatti, Victor, NY (US);
William Stenglein, Churchville, NY (US);
Larry J. Fisk, Ii, West Henrietta, NY (US);
Aaron Radomski, Wyoming, NY (US);
Richard Pham, San Jose, CA (US);
David J. Coumou, Webster, NY (US);
Paul Eyerman, Penfield, NY (US);
Carl Ioriatti, Victor, NY (US);
William Stenglein, Churchville, NY (US);
Larry J. Fisk, II, West Henrietta, NY (US);
Aaron Radomski, Wyoming, NY (US);
Richard Pham, San Jose, CA (US);
MKS Instruments, Inc., Andover, MA (US);
Abstract
A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.