The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
May. 27, 2004
In-sung Park, Seoul, KR;
Young-wook Park, Gyeonggi-do, KR;
Myeong-jin Kim, Gyeonggi-do, KR;
Eun-taek Yim, Seoul, KR;
Han-mei Choi, Seoul, KR;
Kyoung-seok Kim, Seoul, KR;
Beung-keun Lee, Seoul, KR;
In-Sung Park, Seoul, KR;
Young-Wook Park, Gyeonggi-do, KR;
Myeong-Jin Kim, Gyeonggi-do, KR;
Eun-Taek Yim, Seoul, KR;
Han-Mei Choi, Seoul, KR;
Kyoung-Seok Kim, Seoul, KR;
Beung-Keun Lee, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A layer deposition method includes: feeding a reactant with a first flow of an inert gas as a carrier gas into a reaction chamber to chemisorb the reactant on a substrate; feeding the first flow of the inert gas to purge the reaction chamber and a first reactant feed line; and feeding the second flow of the inert gas into the reaction chamber through a feed line different from the first reactant feed line.