The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Dec. 19, 2007
Applicants:

Yoshiaki Komatsu, Fukuoka, JP;

Michio Ishizaki, Fukuoka, JP;

Haruki Miura, Tokyo, JP;

Inventors:

Yoshiaki Komatsu, Fukuoka, JP;

Michio Ishizaki, Fukuoka, JP;

Haruki Miura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 7/44 (2006.01); B01D 53/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exhaust gas treatment method and system of a cement burning facility, wherein a chlorine concentration of the collected fine powder dust is set in a range of 5 to 20% in such a manner that when a part of exhaust gas is extracted as extracted gas from a lowermost part of a preheater, or a kiln inlet part of a cement kiln, a cement raw material is dispersed and the temperature of the extracted gas is held in a range of 950° to 1150° C. By adjusting the dispersion amount of the cement raw material, the extracted gas is cooled to a melting point or less of a chlorine compound, and a classification particle size in a solid-gas separator is then adjusted in a range of 12 μm to 30 μm, to separate for removal and collection fine powder dust.


Find Patent Forward Citations

Komatsu, Yoshiaki. (2011). Exhaust gas treatment method and system in cement burning facility (U.S. Patent No. 8038768). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8038768

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…