The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
May. 29, 2009
Robert S. Bailey, Grove City, OH (US);
Melvin K. Holcomb, Grove City, OH (US);
David B. Smathers, Columbus, OH (US);
Timothy Wiemels, Powell, OH (US);
Robert S. Bailey, Grove City, OH (US);
Melvin K. Holcomb, Grove City, OH (US);
David B. Smathers, Columbus, OH (US);
Timothy Wiemels, Powell, OH (US);
Tosoh SMD, Inc., Grove City, OH (US);
Abstract
A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface that promote more desirable deposition and density patterns of material sputtered from the target surface onto a substrate. A closed dome end of the sputter target is comprised of a first crystallographic orientation and sidewalls of the sputter target are comprised of a crystallographic orientation different from that of the dome. The sputter target is formed, preferably by hydroforming or other metal working techniques, in the absence of annealing. The hydroforming manipulations result in the different crystallographic orientations while minimizing, or ideally omitting, the application of heat. Quick and cost effective non-planar sputter targets that are easily repeatably producable are achievable as a result.