The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Jun. 03, 2005
Nobuaki Nakasu, Kawasaki, JP;
Kaoru Yamada, Mobara, JP;
Yuichiro Tanaka, Fujisawa, JP;
Takeshi Arai, Yokohama, JP;
Hideyuki Honoki, Yokohama, JP;
Kazushi Yoshimura, Kamakura, JP;
Tetsuya Kawamura, Mobara, JP;
Masanori Okawa, Katsuura, JP;
Nobuaki Nakasu, Kawasaki, JP;
Kaoru Yamada, Mobara, JP;
Yuichiro Tanaka, Fujisawa, JP;
Takeshi Arai, Yokohama, JP;
Hideyuki Honoki, Yokohama, JP;
Kazushi Yoshimura, Kamakura, JP;
Tetsuya Kawamura, Mobara, JP;
Masanori Okawa, Katsuura, JP;
Hitachi Displays, Ltd., Chiba-ken, JP;
Abstract
A region surrounded by two gate wiring and two drain wiring includes pixels and when there is a defect of short-circuit in adjacent pixel electrodes, the short-circuited portion is removed by irradiating a laser via a mask having a transmission pattern, which corresponds to a pattern of the gate wiring, drain wiring and pixel electrodes in the short-circuited portion. The above short-circuited portion is identified and removed in comparison to a normal pattern, by use of information from an inspection apparatus, and the pattern defect formed on the substrate is automatically repaired. By applying the above method to a manufacturing process of display apparatus, in particular, to a resist pattern forming process, a display apparatus having a highly qualified display property may be achieved.