The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Aug. 11, 2009
Daniel Christopher Worledge, Poughquag, NY (US);
Philip Louis Trouilloud, Norwood, NJ (US);
David William Abraham, Croton-on-Hudson, NY (US);
Joerg Dietrich Schmid, Hopewell Junction, NY (US);
Daniel Christopher Worledge, Poughquag, NY (US);
Philip Louis Trouilloud, Norwood, NJ (US);
David William Abraham, Croton-on-Hudson, NY (US);
Joerg Dietrich Schmid, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Infineon Technologies North America Corp., San Jose, CA (US);
Abstract
Probes are electrically connected to a surface of a tunnel junction film stack comprising a free layer, a tunnel barrier, and a pinned layer. Resistances are determined for a variety of probe spacings and for a number of magnetizations of one of the layers of the stack. The probe spacings are a distance from a length scale, which is related to the Resistance-Area (RA) product of the tunnel junction film stack. Spacings from as small as possible to about 40 times the length scale are used. Beneficially, the smallest spacing between probes used during a resistance measurement is under 100 microns. A measured in-plane MagnetoResistance (MR) curve is determined from the 'high' and 'low' resistances that occur at the two magnetizations of this layer. The RA product, resistances per square of the free and pinned layers, and perpendicular MR are determined through curve fitting.