The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Jan. 15, 2009
Ju-a Ryu, Seoul, KR;
Jeong-heung Kong, Yongin-si, KR;
Yang-koo Lee, Gwacheon-si, KR;
Hun-hwan Ha, Yongin-si, KR;
Yo-han Ahn, Yongin-si, KR;
Hweon Jin, Yongin-si, KR;
Myung-ki Lee, Hwaseong-si, KR;
Ju-A Ryu, Seoul, KR;
Jeong-Heung Kong, Yongin-si, KR;
Yang-Koo Lee, Gwacheon-si, KR;
Hun-Hwan Ha, Yongin-si, KR;
Yo-Han Ahn, Yongin-si, KR;
Hweon Jin, Yongin-si, KR;
Myung-Ki Lee, Hwaseong-si, KR;
Abstract
The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.