The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Jan. 27, 2006
Hideo Namatsu, Atsugi, JP;
Mitsuru Sato, Kawasaki, JP;
Hideo Namatsu, Atsugi, JP;
Mitsuru Sato, Kawasaki, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;
Abstract
A fine and high-accuracy pattern, which is also excellent in either or both of high sensitivity and etching resistance can be provided. Disclosed is a resist pattern forming method in which a single- or multi-layered filmis formed on a substrateand a resist pattern is formed on the filmthrough a lithography technique including exposure and development, the method comprising performing supercritical processing in which the filmis brought into contact with a supercritical processing solution' in which an organic matteris dissolved before the exposure or development.