The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Nov. 27, 2007
Wei Zhang, Plainsboro, NJ (US);
Hua Tan, Princeton Junction, NJ (US);
Lin HU, Livingston, NJ (US);
Stephen Y. Chou, Princeton, NJ (US);
Wei Zhang, Plainsboro, NJ (US);
Hua Tan, Princeton Junction, NJ (US);
Lin Hu, Livingston, NJ (US);
Stephen Y. Chou, Princeton, NJ (US);
Nanonex Corporation, Monmouth Junction, NJ (US);
Abstract
In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.