The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Jul. 16, 2007
Yasushi Hayashida, Koshi, JP;
Yoshitaka Hara, Koshi, JP;
Yasushi Hayashida, Koshi, JP;
Yoshitaka Hara, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Wafers Ato Aof a first lot A and wafers Bto Bof a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL, a coating unit BCT, a heating unit LHP, a temperature control unit CPL, a coating unit COT, a heating unit LHP, and a cooling unit COL in that order. The process temperature of the heating unit LHPis changed after the last wafer Aof the first lot A has been processed by the heating unit LHP. The wafers of the second lot B are carried according to a carrying schedule such that carrying cycles succeeding a carrying cycle in which the first substrate Bof the second lot B is carried to the second temperature conditioning unit CPLcarry the substrates B of the second lot B succeeding the first substrate Band processed by a heating process by the heating unit LHPin due order to a buffer unit BF, and the wafers B held in the buffer unit BFare carried in due order to the downstream modules after the process temperature of the heating unit LHPhas been changed.