The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Oct. 14, 2008
Mark Crockett, Foster City, CA (US);
John W. Lane, San Jose, CA (US);
Micahel Dechellis, Austin, TX (US);
Chris Melcer, Sunnyvale, CA (US);
Erica Porras, San Jose, CA (US);
Aneesh Khullar, Sunnyvale, CA (US);
Balarabe N. Mohammed, Union City, CA (US);
Mark Crockett, Foster City, CA (US);
John W. Lane, San Jose, CA (US);
Micahel DeChellis, Austin, TX (US);
Chris Melcer, Sunnyvale, CA (US);
Erica Porras, San Jose, CA (US);
Aneesh Khullar, Sunnyvale, CA (US);
Balarabe N. Mohammed, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.