The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Oct. 09, 2009
Raymond Hill, Rowley, MA (US);
Lawrence Scipioni, Beaverton, MA (US);
Colin August Sanford, Atkinson, NH (US);
Mark Dimanna, Fremont, NH (US);
Michael Tanguay, York, ME (US);
Raymond Hill, Rowley, MA (US);
Lawrence Scipioni, Beaverton, MA (US);
Colin August Sanford, Atkinson, NH (US);
Mark DiManna, Fremont, NH (US);
Michael Tanguay, York, ME (US);
FEI Company, Hillsboro, OR (US);
Abstract
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.