The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8012266 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 06, 2011

Filed:

Dec. 15, 2006
Applicants:

John W. Janzen, Andover, MN (US);

Daniel K. Casey, Plymouth, MN (US);

Inventors:

John W. Janzen, Andover, MN (US);

Daniel K. Casey, Plymouth, MN (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 9/032 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and apparatus for cleaning particle deposits from slurry distribution system components by injecting gas bubbles into the slurry solution having a geometry and interval such that an optimal cleaning power and cleaning rate is obtained. The method provides efficient cleaning of the buildup of abrasive particles deposited from the slurry solution without requiring the operator to disassemble or flush the slurry distribution system. The system cleaning potential is optimal when the diameter of the bubbles and the fluid slug length is approximately equal to the pipe diameter.


Find Patent Forward Citations

Janzen, John. (2011). System and method for scrubbing cmp slurry systems (U.S. Patent No. 8012266). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8012266

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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