The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Jun. 30, 2009
Takahito Nakayama, Shizuoka, JP;
Kenji Ohtoshi, Kanagawa, JP;
Osamu Iizuka, Kanagawa, JP;
Shunji Shinkawa, Shizuoka, JP;
Takahito Nakayama, Shizuoka, JP;
Kenji Ohtoshi, Kanagawa, JP;
Osamu Iizuka, Kanagawa, JP;
Shunji Shinkawa, Shizuoka, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A method of acquiring an offset deflection amount for a shaped beam, includes forming reference images of first and second figures which can be shaped by first and second aperture plates placed on a lithography apparatus, and a reference image of a mark; forming first and second convolution reference images based on the reference images of the mark and of the first and second figures; scanning over the mark with charged particle beams shaped into the first and second figures to acquire optical images of the first and second figures; forming first and second convolution synthesis images based on the first convolution reference image and respectively the optical images of the first and second figures; and calculating an offset deflection amount for the charged particle beam shaped into the second figure to match reference positions of the first and second figures based on center-of-gravity positions of the first and second convolution synthesis images.