The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Jun. 26, 2007
Martin Weiss, Portland, OR (US);
Brian Kinnear, Hillsboro, OR (US);
Telly Koffas, Beaverton, OR (US);
David Fryer, Hillsboro, OR (US);
Ming-chuan Yang, Meridian, ID (US);
William T Blanton, Hillsboro, OR (US);
Martin Weiss, Portland, OR (US);
Brian Kinnear, Hillsboro, OR (US);
Telly Koffas, Beaverton, OR (US);
David Fryer, Hillsboro, OR (US);
Ming-chuan Yang, Meridian, ID (US);
William T Blanton, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to collect at least a portion of the radiation reflected from the wafer, the wafer including at least a first region having a first grating pattern oriented in a first direction and at least a second region having a second grating pattern oriented in a second direction, different from the first direction.