The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Nov. 12, 2008
Jonathan G. England, Horsham, GB;
Frank Sinclair, Quincy, MA (US);
John (Bon-woong) Koo, Andover, MA (US);
Rajesh Dorai, Woburn, MA (US);
Ludovic Godet, North Reading, MA (US);
Jonathan G. England, Horsham, GB;
Frank Sinclair, Quincy, MA (US);
John (Bon-Woong) Koo, Andover, MA (US);
Rajesh Dorai, Woburn, MA (US);
Ludovic Godet, North Reading, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
Several examples of a method for processing a substrate are disclosed. In a particular embodiment, the method may include: introducing a plurality of first particles to a first region of the substrate so as to form at least one crystal having a grain boundary in the first region without forming another crystal in a second region, the second region adjacent to the first region; and extending the grain boundary of the at least one crystal formed in the first region to the second region after stopping the introducing the plurality of first particles.