The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Sep. 30, 2008
Banqiu Wu, Sunnyvale, CA (US);
Richard Lee, San Francisco, CA (US);
M. Rao Yalamanchili, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
James S. Papanu, San Rafael, CA (US);
Chung-huan Jeon, San Jose, CA (US);
Banqiu Wu, Sunnyvale, CA (US);
Richard Lee, San Francisco, CA (US);
M. Rao Yalamanchili, Sunnyvale, CA (US);
Ajay Kumar, Cupertino, CA (US);
James S. Papanu, San Rafael, CA (US);
Chung-Huan Jeon, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Aspects of the invention generally provide methods and apparatus for cleaning adhesive residual on a photomask substrate. In one embodiment, the apparatus includes a processing cell, a support assembly configured to receive a photomask substrate disposed thereon disposed in the processing cell, a protection head assembly disposed above and facing the support assembly, and a head actuator configured to control the elevation of the protection head assembly relative to an upper surface of the support assembly. A cleaning device is provided and positioned to interact with the photomask substrate disposed on the support assembly. In another embodiment, a method of cleaning a periphery region of a photomask substrate includes providing a photomask substrate having a periphery portion and a center portion disposed on a support assembly in a processing cell, lowering a protection cover disposed in the processing cell to cover the center portion of the photomask substrate, providing a brush in the processing cell to clean the periphery portion of the photomask substrate.