The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Jun. 26, 2009
Scott Jeffrey Weigel, Allentown, PA (US);
Mark Leonard O'neill, Allentown, PA (US);
Bing Han, Lansdale, PA (US);
Hansong Cheng, Allentown, PA (US);
Manchao Xiao, San Diego, CA (US);
Chia-chien Lee, Chupei, TW;
Scott Jeffrey Weigel, Allentown, PA (US);
Mark Leonard O'Neill, Allentown, PA (US);
Bing Han, Lansdale, PA (US);
Hansong Cheng, Allentown, PA (US);
Manchao Xiao, San Diego, CA (US);
Chia-Chien Lee, Chupei, TW;
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The present invention is a process for spin-on deposition of a silicon dioxide-containing film under oxidative conditions for gap-filling in high aspect ratio features for shallow trench isolation used in memory and logic circuit-containing semiconductor substrates, such as silicon wafers having one or more integrated circuit structures contained thereon, comprising the steps of: