The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2011

Filed:

Feb. 26, 2003
Applicants:

Akira Kuibira, Itami, JP;

Masuhiro Natsuhara, Itami, JP;

Hirohiko Nakata, Itami, JP;

Inventors:

Akira Kuibira, Itami, JP;

Masuhiro Natsuhara, Itami, JP;

Hirohiko Nakata, Itami, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); F27B 5/04 (2006.01); F27B 5/14 (2006.01); F27D 5/00 (2006.01); F27D 11/00 (2006.01); H05B 3/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

A heating device for manufacturing semiconductor capable of uniformly heating a wafer or other materials to be treated, and in particular a heating device in a coater-developer used for heat-hardening of resin film for photolithography and for heat-calcining of low-dielectric constant insulating film, is provided. A device of this invention comprises a ceramic holderhaving a resistive heating elementembedded therein, which holds and heats a waferor another material to be treated; a cylindrical support memberwhich supports the ceramic holder; and a chamberwhich houses these. The support memberand ceramic holderare not hermetically sealed, or alternatively the atmospheres within the cylindrical support memberand within the chamberare maintained to be substantially the same by adjusting the introduction and evacuation of gas.


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