The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Jan. 31, 2008
Naohiko Suemura, Sodegaura, JP;
Keiko Yoshitake, Sodegaura, JP;
Naohiko Suemura, Sodegaura, JP;
Keiko Yoshitake, Sodegaura, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
Colloidal silica particles dispersed in a reactive monomer may cause the polymerization, degradation, or the like of the reactive monomer by an action of the solid acidity of the surfaces of the particles and a monomer may be polymerized during a process for producing a monomer-dispersed silica sol, or a stable silica sol may not be obtained. In addition, a polymer of a resin formed article etc. obtained by curing a monomer-dispersed silica sol may be deteriorated, degraded, or the like with time. Therefore, there are provided a reactive monomer-dispersed silica sol having high stability by reducing the solid acidity of the surfaces of the colloidal silica particles contained in the reactive monomer-dispersed silica sol, and a production method thereof, and a curable composition using the reactive monomer-dispersed silica sol, and a cured article in which the deterioration, the degradation, or the like of the polymer is suppressed. The present invention provides a reactive monomer-dispersed silica sol containing a colloidal silica particle in which an alkaline earth metal ion is bonded to a surface of the colloidal silica particle.