The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Jul. 09, 2008
Nam-myun Cho, Seoul, KR;
Myeong-cheol Kim, Suwon, KR;
Shi-yong Yi, Seongham, KR;
Young-hoon Song, Seoul, KR;
Young-ju Park, Seoul, KR;
Nam-Myun Cho, Seoul, KR;
Myeong-Cheol Kim, Suwon, KR;
Shi-Yong Yi, Seongham, KR;
Young-Hoon Song, Seoul, KR;
Young-Ju Park, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
For integrated circuit fabrication, at least one spacer support structure is formed in a first area over a semiconductor substrate, and a mask material is deposited on exposed surfaces of the spacer support structure and on a second area over the semiconductor substrate. A masking structure is formed on a portion of the mask material in the second area, and the mask material is patterned to form spacers on sidewalls of the spacer support structure and to form a mask pattern under the masking structure. The spacer support structure and the masking structure are comprised of respective high carbon content materials that have been spin-coated and have substantially a same etch selectivity.