The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Apr. 10, 2009
Tadahiro Ohmi, Sendai, JP;
Akinobu Teramoto, Sendai, JP;
Rui Hasebe, Sakai, JP;
Masayuki Miyashita, Sakai, JP;
Tadahiro Ohmi, Sendai, JP;
Akinobu Teramoto, Sendai, JP;
Rui Hasebe, Sakai, JP;
Masayuki Miyashita, Sakai, JP;
National University Corporation Tohoku University, Miyagi, JP;
Stella Chemifa Corporation, Osaka, JP;
Abstract
Disclosed is a method for cleaning a semiconductor substrate that can solve a problem of a conventional cleaning method which should include at least five steps for cleaning a substrate such as a semiconductor substrate. The method for cleaning a semiconductor substrate comprises a first step of cleaning a substrate with ultrapure water containing ozone, a second step of cleaning the substrate with ultrapure water containing a surfactant, and a third step of removing an organic compound derived from the surfactant, with a cleaning liquid containing ultrapure water and 2-propanol. After the third step, plasma of noble gas such as krypton is applied to the substrate to further remove the organic compound derived from the surfactant.