The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Mar. 10, 2008
Pantas Sutardja, Los Gatos, CA (US);
Albert Wu, Palo Alto, CA (US);
Winston Lee, Palo Alto, CA (US);
Peter Lee, Fremont, CA (US);
Chien-chuan Wei, Sunnyvale, CA (US);
Runzi Chang, San Jose, CA (US);
Pantas Sutardja, Los Gatos, CA (US);
Albert Wu, Palo Alto, CA (US);
Winston Lee, Palo Alto, CA (US);
Peter Lee, Fremont, CA (US);
Chien-Chuan Wei, Sunnyvale, CA (US);
Runzi Chang, San Jose, CA (US);
Marvell International Ltd., Hamilton, BM;
Abstract
Methods for patterning high-density features are described herein. Embodiments of the present invention provide a method comprising patterning a first subset of a pattern, the first subset configured to form a plurality of lines over the substrate, and patterning a second subset of the pattern, the second subset configured to form a plurality of islands over the substrate, wherein said patterning the first subset and said patterning the second subset comprise at least two separate patterning operations.