The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Jun. 22, 2009
François Perruchot, Grenoble, FR;
Bernard Diem, Echirolles, FR;
Vincent Larrey, La Murette, FR;
Laurent Clavelier, Grenoble, FR;
Emmanuel Defay, Vorepe, FR;
François Perruchot, Grenoble, FR;
Bernard Diem, Echirolles, FR;
Vincent Larrey, La Murette, FR;
Laurent Clavelier, Grenoble, FR;
Emmanuel Defay, Vorepe, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
The invention relates to a method of making a component from a heterogeneous substrate comprising first and second portions in at least one monocrystalline material, and a sacrificial layer constituted by at least one stack of at least one layer of monocrystalline Si situated between two layers of monocrystalline SiGe, the stack being disposed between said first and second portions of monocrystalline material, wherein the method consists in etching said stack by making: