The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Oct. 09, 2008
Eddy Cornelis Antonius Van Der Heijden, Netersel, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Dorothea Maria Christina Oorschot, Eindhoven, NL;
Hieronymus Johannus Christiaan Meessen, Eindhoven, NL;
Yin Fong Choi, Eindhoven, NL;
Eddy Cornelis Antonius Van Der Heijden, Netersel, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Dorothea Maria Christina Oorschot, Eindhoven, NL;
Hieronymus Johannus Christiaan Meessen, Eindhoven, NL;
Yin Fong Choi, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CDof the elements of the first structure is different from a design width CDof the elements of the second structure. The difference in design width can be used to identify measurement points having incorrectly measured overlay errors.