The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2011

Filed:

Apr. 01, 2008
Applicants:

M. Dalil Rahman, Flemington, NJ (US);

David Abdallah, Bernardsville, NJ (US);

Rhuzi Zhang, Pennington, NJ (US);

Douglas Mckenzie, Easton, PA (US);

Inventors:

M. Dalil Rahman, Flemington, NJ (US);

David Abdallah, Bernardsville, NJ (US);

Rhuzi Zhang, Pennington, NJ (US);

Douglas McKenzie, Easton, PA (US);

Assignee:

AZ Electronic Materials USA Corp, Somerville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/30 (2006.01); B29C 59/16 (2006.01); C08F 291/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, Rto Rare independently selected from hydrogen and C-Calkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.


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