The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Aug. 07, 2008
Daisuke Morisawa, Nirasaki, JP;
Masayuki Hirose, Nirasaki, JP;
Daisuke Morisawa, Nirasaki, JP;
Masayuki Hirose, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A control device is provided that flexibly controls a substrate processing apparatus for each product process. Four process recipes PMto PMare stored in a first storage unit. Corresponding to each of the process recipes, a high temperature, a medium temperature, and a low temperature pre-recipe are stored in a second storage unit. A process recipe determination unitdetermines, in response to a recipe specified by the operator, a process recipe corresponding to the specified recipe from the first storage unit. A stage temperature acquisition unitacquires, from the determined process recipe, a stage temperature. A pre-recipe selection unitselects, from the three types of pre-recipes stored in the second storage unit, one pre-recipe corresponding to the stage temperature. Before the wafer W is deposition-processed, therefore, the PM may be well-conditioned according to the selected pre-recipe.