The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Nov. 16, 2006
Hyun Koock Shin, Suwon, KR;
Bum Soo Kim, Cheonan, KR;
Jin Sik Kim, Suwon, KR;
Jun Young Kim, Anyang, KR;
Young Seop Kim, Icheon, KR;
BO Yearn Cho, Pyeongtaek, KR;
Hyun Koock Shin, Suwon, KR;
Bum Soo Kim, Cheonan, KR;
Jin Sik Kim, Suwon, KR;
Jun Young Kim, Anyang, KR;
Young Seop Kim, Icheon, KR;
Bo Yearn Cho, Pyeongtaek, KR;
UP Chemical Co., Ltd., Gyeonggi-Do, KR;
Abstract
A method for the vapor deposition of aluminum films is provided. Such method employs a dialkyl amido dihydroaluminum compound of the formula [HAlNRR]wherein Rand Rare the same or different alkyl groups having 1 to 3 carbons, and n is an integer of 2 or 3. The aluminum films may be thick or thin and may be aluminum films or may be mixed metal films with aluminum metal. Both CVD and ALD methods may be employed.