The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Aug. 07, 2008
Applicants:
Matthew E. Colburn, Hopewell Junction, NY (US);
Kenneth Raymond Carter, San Jose, CA (US);
Gary M. Mcclelland, Palo Alto, CA (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Inventors:
Matthew E. Colburn, Hopewell Junction, NY (US);
Kenneth Raymond Carter, San Jose, CA (US);
Gary M. McClelland, Palo Alto, CA (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.