The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Dec. 31, 2004
John Kouvetakis, Mesa, AZ (US);
Cole J. Ritter, Iii, Phoenix, AZ (US);
John Tolle, Gilbert, AZ (US);
John Kouvetakis, Mesa, AZ (US);
Cole J. Ritter, III, Phoenix, AZ (US);
John Tolle, Gilbert, AZ (US);
Abstract
A method is provided for synthesizing silicon-germanium hydride compounds of the formula (HGe)SiH, wherein x=0, 1, 2 or 3. The method includes combining a silane triflate with a compound having a GeHligand under conditions whereby the silicon-germanium hydride is formed. The compound having the GeHligand is selected from the group consisting of KGeH, NaGeHand MRGeH, wherein M is a Group IV element and R is an organic ligand. The silane triflate can be HSi(OSOCF)or HSi(OSOCF). The method can be used to synthesize trisilane, (HSi)SiH, and the iso-tetrasilane analog, (HSi)SiH, by combining a silane triflate with a compound comprising a SiHligand under conditions whereby the silicon hydride is formed. The silane triflate can include HSi(OSOCF)or HSi(OSOCF)wherein x=1 or 2. A method for synthesizing (HGe)SiHincludes combining HGeSiH(OSOCF) with KGeHunder conditions whereby (HGe)SiHis formed.