The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Mar. 27, 2007
Applicants:
Cherng-chyi Han, San Jose, CA (US);
Min LI, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Chen-jung Chien, Sunnyvale, CA (US);
Inventors:
Cherng-Chyi Han, San Jose, CA (US);
Min Li, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Chen-Jung Chien, Sunnyvale, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/187 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.