The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
May. 31, 2007
Cherng-chyi Han, San Jose, CA (US);
Min LI, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Lijie Guan, San Jose, CA (US);
Cherng-Chyi Han, San Jose, CA (US);
Min Li, Dublin, CA (US);
Fenglin Liu, Milpitas, CA (US);
Lijie Guan, San Jose, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CHOH, CO or NHor their combinations, produces the desired result. A write gap layer and an upper shield is then formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.