The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Aug. 24, 2006
Kevin J. Torek, Meridian, ID (US);
Todd R. Abbott, Boise, ID (US);
Sandra L. Tagg, Boise, ID (US);
Amy Weatherly, Boise, ID (US);
Kevin J. Torek, Meridian, ID (US);
Todd R. Abbott, Boise, ID (US);
Sandra L. Tagg, Boise, ID (US);
Amy Weatherly, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A photoresist processing method includes treating a substrate with a sulfur-containing substance. A positive-tone photoresist is applied on and in contact with the treated substrate. The method includes selectively exposing a portion of the photoresist to actinic energy and developing the photoresist to remove the exposed portion and to form a photoresist pattern on the substrate. The treating with a sulfur-containing substance reduces an amount of residual photoresist intended for removal compared to an amount of residual photoresist that remains without the treating.