The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Feb. 19, 2009
Fumihiro Hayashi, Osaka, JP;
Yasuhiro Okuda, Osaka, JP;
Fumihiro Hayashi, Osaka, JP;
Yasuhiro Okuda, Osaka, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
An expanded porous polytetrafluoroethylene film having residual strain of at most 11.0% as measured after a load required to indent a rod, which is in a columnar form that its outer diameter is at least 2 mm and at least 1.9 times as much as the thickness of the film, and has a smooth plane perpendicular to its axis at a free end surface thereof and a modulus of longitudinal elasticity of at least 1.0×10kgf/mm, up to 20% of the film thickness at a strain rate of 100%/min from the free end surface is applied repeatedly 20 times, and a production process of the porous film, in which a step of compressing an expanded porous polytetrafluoroethylene film having a high draw ratio is provided.