The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Sep. 09, 2009
Thomas A. Case, Walnut Creek, CA (US);
Wenbing Yun, Walnut Creek, CA (US);
Alan Francis Lyon, Berkeley, CA (US);
Thomas A. Case, Walnut Creek, CA (US);
Wenbing Yun, Walnut Creek, CA (US);
Alan Francis Lyon, Berkeley, CA (US);
Xradia, Inc., Concord, CA (US);
Abstract
A metrology system that uses an imaging system to monitor alignment features on the sample or sample holder of an X-ray laminography or tomography system. the metrology system has the capability to provide both sample shift and sample rotation movement data to a data acquisition system. These shift and rotation data can be used in alignment routines to produce 3D reconstructions from the X-ray images/projections. The metrology system is based on an imaging and focusing measurement of intrinsic feature of the sample or artificial features fabricated on the sample or sample holder.