The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Sep. 01, 2006
Natsuko Ito, Kanagawa, JP;
Mitsuo Yasaka, Kumamoto, JP;
Fumihiko Uesugi, Kanagawa, JP;
Yousuke Itagaki, Kanagawa, JP;
Natsuko Ito, Kanagawa, JP;
Mitsuo Yasaka, Kumamoto, JP;
Fumihiko Uesugi, Kanagawa, JP;
Yousuke Itagaki, Kanagawa, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Abstract
In a plasma processing apparatus having an electrostatic chuck for holding a semiconductor wafer by an electrostatic adsorption force and a DC power supply for applying an electrostatic adsorption voltage to the electrostatic chuck, abnormal discharge in plasma is suppressed by providing the apparatus with a signal detector that detects a foresee signal that foresees occurrence of abnormal discharge in plasma, and a controller that controls ESC leakage current based upon the foresee signal. If the foresee signal is outside a prescribed range, control is exercised so as to reduce the absolute value of the electrostatic adsorption voltage, thereby suppressing the occurrence of an abnormal discharge.