The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Jul. 12, 2010
Won-bae Jang, Osan-si, KR;
Seung-chul Kim, Suwon-si, KR;
Chan-seung Choi, Suwon-si, KR;
Min-suk Kim, Suwon-si, KR;
Chee-wan Kim, Seoul, KR;
Sun-yong Lee, Seoul, KR;
Sang-rok Hah, Seoul, KR;
Won-bae Jang, Osan-si, KR;
Seung-chul Kim, Suwon-si, KR;
Chan-seung Choi, Suwon-si, KR;
Min-suk Kim, Suwon-si, KR;
Chee-wan Kim, Seoul, KR;
Sun-yong Lee, Seoul, KR;
Sang-rok Hah, Seoul, KR;
Abstract
Semiconductor process evaluation methods perform multiple scans of a test semiconductor substrate (e.g., test wafer) using ion beams under different ion implanting conditions. Parameters of the test semiconductor substrate that was scanned using the ion beams under different ion implanting conditions are then measured to conduct the semiconductor process evaluation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile