The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Apr. 22, 2007
Hiroji Hanawa, Sunnyvale, CA (US);
Andrew Nguyen, San Jose, CA (US);
Keiji Horioka, Tokyo, JP;
Kallol Bera, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Lawrence Wong, Fremont, CA (US);
Martin Jeff Salinas, San Jose, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Andrew Nguyen, San Jose, CA (US);
Keiji Horioka, Tokyo, JP;
Kallol Bera, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Lawrence Wong, Fremont, CA (US);
Martin Jeff Salinas, San Jose, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.