The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7971181 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 28, 2011

Filed:

Jul. 14, 2006
Applicants:

Steven E. Pabalate, Raleigh, NC (US);

Jeffrey R. Amspaugh, Great Falls, VA (US);

Christine M. Rebok, Ashburn, VA (US);

Brian S. Birtell, Falls Church, VA (US);

Robert P. Sarlo, Fairfax, VA (US);

Inventors:

Steven E. Pabalate, Raleigh, NC (US);

Jeffrey R. Amspaugh, Great Falls, VA (US);

Christine M. Rebok, Ashburn, VA (US);

Brian S. Birtell, Falls Church, VA (US);

Robert P. Sarlo, Fairfax, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

Project information relating to a project is received, the project information identifying a project type, an authorized write entity, and an authorized approval entity, and a valid metric is selected based at least on the project type, the valid metric measuring an aspect of performance of the project. Base measures corresponding to the valid metric are received from the authorized write entity, the base measures further including periodic base measures corresponding to at least one metric period, and aperiodic base measures corresponding to an aperiodic incident, and the valid metric is calculated based on the base measures. The base measures are sorted into excluded base measures and non-excluded base measures, organizational baseline data is imported, and an organizational indicator is calculated based on the non-excluded base measures and the organizational baseline data.


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