The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7969581 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 28, 2011

Filed:

Oct. 05, 2010
Applicants:

Lei Lian, Santa Clara, CA (US);

Matthew Fenton Davis, Brookedale, CA (US);

Inventors:

Lei Lian, Santa Clara, CA (US);

Matthew Fenton Davis, Brookedale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.


Find Patent Forward Citations

Lian, Lei. (2011). Determining endpoint in a substrate process (U.S. Patent No. 7969581). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7969581

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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