The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Nov. 07, 2008
Jia-yush Yen, Taipei, TW;
Shuo-hung Chang, Taipei County, TW;
Cheng-hung Chen, Changhua, TW;
Lien-sheng Chen, Banciao, TW;
Jia-Yush Yen, Taipei, TW;
Shuo-Hung Chang, Taipei County, TW;
Cheng-Hung Chen, Changhua, TW;
Lien-Sheng Chen, Banciao, TW;
Industrial Technology Research Institute, Hsin-Chu, TW;
Abstract
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography. Besides, the present invention further provides a system for step-and-align interference lithography, which is capable of compensating the positioning error caused by a stepping movement control used for moving a substrate or the light beams in a stepwise manner to form interference-patterned regions by interference lithography and thus the so-generated interference-patterned regions are accurate aligned with one another on a two-dimensional plane for preparing the same to be stitched together to form a two-dimensional large-area periodic structure.