The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Nov. 07, 2008
Zhi-wen Sun, San Jose, CA (US);
Bob Kong, San Jose, CA (US);
Igor Ivanov, Danville, CA (US);
Tony Chiang, Campbell, CA (US);
Zhi-Wen Sun, San Jose, CA (US);
Bob Kong, San Jose, CA (US);
Igor Ivanov, Danville, CA (US);
Tony Chiang, Campbell, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
Processes for minimizing contact resistance when using nickel silicide (NiSi) and other similar contact materials are described. These processes include optimizing silicide surface cleaning, silicide surface passivation against oxidation and techniques for diffusion barrier/catalyst layer deposition. Additionally, processes for generating a noble metal (for example platinum, iridium, rhenium, ruthenium, and alloys thereof) activation layer that enables the electroless barrier layer deposition on a NiSi-based contact material are described. The processes may be employed when using NiSi-based materials in other end products. The processes may be employed on silicon-based materials.