The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Mar. 02, 2005
Yasuhiro Takaki, Koshi, JP;
Osamu Miyahara, Koshi, JP;
Keiichi Tanaka, Koshi, JP;
Shinya Wakamizu, Koshi, JP;
Takashi Terada, Koshi, JP;
Yasuhiro Takaki, Koshi, JP;
Osamu Miyahara, Koshi, JP;
Keiichi Tanaka, Koshi, JP;
Shinya Wakamizu, Koshi, JP;
Takashi Terada, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP) of throwing off a developing solution from the substrate after development; a step (STEP) of supplying a water-based cleaning liquid onto the substrate; a step (STEP) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEPis arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEPis arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.