The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Apr. 01, 2008
Applicant:
Masayoshi Saito, Tokyo, JP;
Inventor:
Masayoshi Saito, Tokyo, JP;
Assignee:
Elpida Memory, Inc., Chuo-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask reticle for use in projection exposure to form a resist pattern on a workable film formed over a semiconductor substrate, includes a first area in which a light shield is formed, a second area formed around said first area, a third area formed around said second area; and a fourth area formed around said third area, the areas being formed over a substrate, a relationship between transmissivities of said areas being second area transmissivity>fourth area transmissivity>third area transmissivity>first area transmissivity.