The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Dec. 13, 2006
Applicant:
Jea-woo Park, Wilsonville, OR (US);
Inventor:
Jea-Woo Park, Wilsonville, OR (US);
Assignee:
Mentor Graphics Corporation, Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.
Park, Jea-Woo. (2011). Selective shielding for multiple exposure masks (U.S. Patent No. 7966585). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7966585
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile