The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Jul. 08, 2008
Paulus J. M. Van Adrichem, Wijchen, NL;
Yunqiang Zhang, Sunnyvale, CA (US);
Paulus J. M. Van Adrichem, Wijchen, NL;
Yunqiang Zhang, Sunnyvale, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Embodiments of the present invention provide systems and techniques for determining the effect of process variations. During operation, the system can receive a layout which includes multiple instances of a pattern. Next, the system can correct the pattern instances using different photolithography process models which model the photolithography process at different exposure and focus conditions. Next, the corrected layout can be printed on a wafer. The system can then perform electrical tests on the wafer, or it can measure the critical dimensions of the features on the wafer. The yield loss or the exposure-focus matrix can then be generated by using the test data or the measurement data.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile