The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Mar. 27, 2007
Ichiro Nakamoto, Tokyo, JP;
Hiroshi Horai, Tokyo, JP;
Tatsuya Sodekoda, Tokyo, JP;
Masahiro Yoshida, Tokyo, JP;
Ichiro Nakamoto, Tokyo, JP;
Hiroshi Horai, Tokyo, JP;
Tatsuya Sodekoda, Tokyo, JP;
Masahiro Yoshida, Tokyo, JP;
IHI Corporation, Tokyo, JP;
Abstract
In an ion implanting apparatusincluding a separation slitwhich receives an ion beamhaving passed through a mass-separation electromagnetand allows a desired type of ion to selectively pass therethrough, the separation slitis operable to vary a shape of a gap through which the ion beampasses. In addition, the ion implanting apparatusincludes a variable slitwhich is disposed between an extraction electrode systemand the mass-separation electromagnetso as to form a gap through which the ion beampasses and is operable to vary a shape of the gap so as to shield a part of the ion beamextracted from the ion sourceThe ion implanting apparatusmay include both or one of the separation slitand the variable slit