The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Nov. 16, 2005
Randall S. Mundt, Pleasanton, CA (US);
Paul D. Macdonald, Tracy, CA (US);
Andrew Beers, Liberty Hill, TX (US);
Mason L. Freed, Pleasant Hill, CA (US);
Costas J. Spanos, Lafayette, CA (US);
Randall S. Mundt, Pleasanton, CA (US);
Paul D. MacDonald, Tracy, CA (US);
Andrew Beers, Liberty Hill, TX (US);
Mason L. Freed, Pleasant Hill, CA (US);
Costas J. Spanos, Lafayette, CA (US);
KLA-TENCOR Corporation, San Jose, CA (US);
Abstract
A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.